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Kanto Chemical - Post-CMP Cleaning Solutions

No chemical damage to metal and dielectric materials.

Removal of various contamination from wafer surface (slurry abrasives, organic residues) during pCMP cleaning.

CMP-M series: for metal impurities and particles with W and Cu Interconnections.

CMP-B series: for organic residues, metal impurities and particles with W and/or Cu Interconnections.

  • Chemical
  • Electronics
  • Semiconductor, Solar & Electronics
KANTO CHEMICAL CO., INC.The electronic chemical division of Kanto Chemical offers a complete range of chemistries for the semiconductor applications. Among this portfolio, Kanto Chemical is eager to propose solutions for the Post-CMP cleaning, some Post-Ashing residue removers and resist strippers and Gold plating solutions.
[Kanto Chemical, Electronic chemical, Post-CMP Cleaning Solutions]